Photonics Industries DP

Ultra-Efficient High Energy Nanosecond Lasers 

  • New DP MAX up to 3 J at 10 Hz
  • Up to 50 mJ (TEM00) or 200 mJ (multimode) pulses at 100 Hz
  • Repetition rates up to 1 kHz
  • Superior efficiency, significantly minimising heat load
  • Short pulse widths between 6 and 15 ns
  • Multiwavelength options: IR, Green, UV, and DUV
  • Compact, monolithic all-in-one form factor for easy integration

Photonics Industries’ DP Series of diode-pumped solid-state (DPSS) Q-Switched nanosecond lasers offer exceptional performance tailored for demanding industrial and scientific requirements.  

 The DP range includes the new DP MAX range of multimode high energy lasers. While the standard DP Series provides up to 50 mJ at 100 Hz, the DP MAX Series scales energy significantly, delivering up to 3 J at 10 Hz or 200 mJ at 100 Hz. Together, these configurations address a vast range of applications requiring stable, repeatable pulses without the maintenance burden and downtime, or performance drift of traditional lamp-pumped lasers. 

The DP MAX Series is designed as a compact, monolithic platform, featuring a fully sealed industrial laser head and a short optical path for mechanical stability. It offers a circular multimode beam profile with M2 < 8 and exceptional pulse-to-pulse energy stability down to <0.2% RMS. For simplified integration, it includes a motorised output attenuator as standard and a fully detachable umbilical. Additionally, the DP MAX diodes boast extended lifetimes exceeding 10 billion pulses, ensuring maximum system uptime. 

For applications requiring superior beam quality, the DP and DP1k series offer true TEM00 output with M2 typically below 1.5. The DP1k series is optimized for high-speed tasks, delivering up to 20 mJ at 1 kHz. The DP Series is designed as a small, robust, and reliable all-in-one (AIO) form factor, ideal for easy integration into systems. 

All DP lasers are available in IR and harmonic wavelengths (green, UV and DUV). Features like Multiwavelength Selectable (MWS) and Blended (MWB) options on the TEM00 series allow for a flexible output spectrum. 

Across the entire DP range, all lasers benefit from exceptional efficiency, achieving up to 10% conversion from wall power. This architecture generates significantly less waste heat, up to 10x lower than lamp-pumped alternatives, which reduces stress on optical components and improves thermal stability.  

Control is comprehensive, utilising Total Pulse Control features such as Duty Control and PEC (Power or Pulse Energy Control). The DP1k series also benefits from proprietary Direct Access PWC Control for dynamic, real-time pulse-to-pulse energy control at up to 1 kHz. Operational convenience is prioritized with fast warm-up times, typically under 5 minutes from standby, and comprehensive connectivity via Ethernet, RS232, and TTL triggering. 

The high pulse energy and exceptional beam quality make the DP Series suitable for a broad spectrum of demanding tasks. The DP MAX is particularly suited for semiconductor annealing, shock peening, and satellite ranging. Applications for the TEM00 DP series include material processing such as drilling, marking, atomic excitation, quantum physics, LIBS, and spectroscopy.  

To discuss your requirements or to learn more about the DP Series specifications, please contact us. 

Model Wavelength Power Pulse Energy Pulsewidth Mode
DP MAX
DPM-3000-10-1064 1064 nm 3 J at 10 Hz 8-15 ns Multimode
DPM-3000-10-532 532 nm 1.5 J at 10 Hz
DPM-1000-20-355 355 nm 400 mJ at 20 Hz
DPM-1000-20-266 266 nm 90 mJ at 20 Hz
DPM-200-100-1064 1064 nm 200 mJ at 100 Hz
DPM-200-100-532 532 nm 100 mJ at 100 Hz
DPM-200-100-355 355 nm 70 mJ at 100 Hz
DPM-200-100-266 266 nm 15 mJ at 100 Hz
DP
DP50-1030 1030 nm 5 W at 100 Hz 50 mJ at 100 Hz 6-10 ns TEM00
DP50-515 515 nm 2.5 W at 100 Hz 25 mJ at 100 Hz
DP50-343 343 nm 1.5 W at 100 Hz 15 mJ at 100 Hz
DP50-257 257 nm 250 mW at 100 Hz 2.5 mJ at 100 Hz
DP20-1053 1053 nm 2 W at 100 Hz 20 mJ at 100 Hz
DP20-527 527 nm 1 W at 100 Hz 10 mJ at 100 Hz
DP20-351 351 nm 500 mW at 100 Hz 5 mJ at 100 Hz
DP20-263 263 nm 100 mW at 100 Hz 1 mJ at 100 Hz
DP5-1064 1064 nm 250 mW at 100 Hz 2.5 mJ at 100 Hz
DP5-532 532 nm 150 mW at 100 Hz 1.5 mJ at 100 Hz
DP5-355 355 nm 100 mW at 100 Hz 1 mJ at 100 Hz
DP5-266 266 nm 15 mW at 100 Hz 0.15 mJ at 100 Hz
DP1k
DP1k-20-1064 1064 nm 15 W at 1 kHz 15 mJ at 1 kHz 6-12 ns TEM00
DP1k-10-1064 10 W at 1 kHz 10 mJ at 1 kHz
DP1k-5-1064 5 W at 1 kHz 5 mJ at 1 kHz
DP1k-20-532 532 nm 10 W at 1 kHz 10 mJ at 1 kHz
DP1k-10-532 5 W at 1 kHz 5 mJ at 1 kHz
DP1k-5-532 3 W at 1 kHz 3 mJ at 1 kHz
DP1k-20-355 355 nm 10 W at 1 kHz 5 mJ at 1 kHz
DP1k-10-355 3 W at 1 kHz 3 mJ at 1 kHz
DP1k-5-355 2 W at 1 kHz 2 mJ at 1 kHz
DP1k-20-266 266 nm 1 W at 1 kHz 1 mJ at 1 kHz
DP1k-10-266 0.5 W at 1 kHz 0.5 mJ at 1 kHz
DP1k-5-266 0.3 W at 1 kHz 0.3 mJ at 1 kHz

Material Processing: Drilling, Cleaning, Marking, Scribing, Grooving 

Semiconductor Annealing 

Laser Shock Peening 

Ion Generation, Atomic Excitation, and Quantum Physics 

Laser Induced Forward Transfer (LIFT) 

Pulsed Laser Deposition (PLD) 

LIBS and Advanced Spectroscopy Systems 

Photoacoustic Imaging and Metrology 

OPO, Dye Laser and Ti:Sapphire Pumping